COPPERMINE
associated with 8 other trademarks
treatment for the deposition of thin films on semiconductor wafers; chemical deposition process for the deposition of thin films on semiconductor wafe...

Words that describe this trademark:

deposition process  thin films  semiconductor wafers  chemical deposition  process  wafers  films  deposition  treatment 

Serial Number:

76410866

Mark:

COPPERMINE

Status:

Cancelled-Section 8

Status Date:

03-07-2010

Filing Date:

Registration Number:

2746559

Registration Date:

08-05-2003

Goods and Services:

treatment for the deposition of thin films on semiconductor wafers; chemical deposition process for the deposition of thin films on semiconductor wafers, namely, process for the chemical vapor deposition of copper films

Mark Description:

N/A

Class:

Treatment of materials.

Type of Mark:

Servicemark

Published for Opposition Date:

05-13-2003

Mark Drawing Status:

Typed Drawing

Abandon Date:

N/A

Business Name:

BURNS, DOANE, SWECKER & MATHIS, L.L.P.

Correspondent Name:

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