ELEMENT
associated with 6 other trademarks
non-abrasive polishing pads for chemical-mechanical planarizing or chemical-mechanical polishing (CMP) machines for use in the manufacture of semicond...

Words that describe this trademark:

semiconductor wafers  polishing pads  integrated circuits  machines  pads  nonabrasive  polishing  manufacture  wafers  cmp 

Serial Number:

77869721

Mark:

ELEMENT

Status:

Cancelled-Section 8

Status Date:

02-28-2020

Filing Date:

Registration Number:

4372801

Registration Date:

07-23-2013

Goods and Services:

non-abrasive polishing pads for chemical-mechanical planarizing or chemical-mechanical polishing (CMP) machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets

Mark Description:

N/A

Class:

Machines and machine tools

Type of Mark:

Trademark

Published for Opposition Date:

04-13-2010

Mark Drawing Status:

Standart Character Mark

Abandon Date:

N/A

Business Name:

N/A

Recent Trademark filings by this company