GIGAMASK
associated with 0 other trademarks
apparatus and instruments for electron beam lithography; electric, electronic, optical, optoelectronic and beam radiation apparatus and instruments, a...

Words that describe this trademark:

electron beam lithography  beam lithography  beam radiation  electronic optical  electric electronic  lithography  apparatus  optical  optoelectronic  instruments 

Serial Number:

75135622

Mark:

GIGAMASK

Status:

Cancelled-Section 8

Status Date:

01-15-2005

Filing Date:

Registration Number:

2150172

Registration Date:

04-14-1998

Goods and Services:

apparatus and instruments for electron beam lithography; electric, electronic, optical, optoelectronic and beam radiation apparatus and instruments, all for writing masks, reticles and patterns used in the manufacture of semiconductor components; irradiation apparatus and instruments; parts and fittings for all the aforesaid goods

Mark Description:

N/A

Class:

Scientific

Type of Mark:

Trademark

Published for Opposition Date:

08-05-1997

Mark Drawing Status:

Typed Drawing

Abandon Date:

N/A

Business Name:

EVENSON, MCKEOWN, EDWARDS & LENAHAN

Correspondent Name:

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