KP
By: KOCH MICROELECTRONIC SERVICE COMPANY, INC.
associated with 3 other trademarks
HIGH PURITY CHEMICALS USED IN THE WAFER MANUFACTURING PROCESS FOR MICROELECTRONICS INDUSTRY, NAMELY, SULFURIC ACID, HYDOCHLORIC ACID, HYDROGEN PEROXID...

Words that describe this trademark:

wafer manufacturing process  high purity chemicals  sulfuric acid  manufacturing process  microelectronics industry  purity chemicals  chemicals  process  industry  used 

Serial Number:

75470808

Mark:

KP

Status:

Cancelled-Section 8

Status Date:

04-19-2008

Filing Date:

Registration Number:

2470013

Registration Date:

07-17-2001

Goods and Services:

HIGH PURITY CHEMICALS USED IN THE WAFER MANUFACTURING PROCESS FOR MICROELECTRONICS INDUSTRY, NAMELY, SULFURIC ACID, HYDOCHLORIC ACID, HYDROGEN PEROXIDE, HYDROFLUORIC ACID, ISOPROPYL ALCOHOL, AMMONIUM HYDROXIDE, XYLENE, NITRIC ACID, ACETIC AND PHOSPHORIC ACID

Mark Description:

N/A

Class:

Chemicals

Type of Mark:

Trademark

Published for Opposition Date:

01-04-2000

Owner:

Mark Drawing Status:

5S15

Abandon Date:

N/A

Business Name:

SHOOK HARDY & BACON LLP

Correspondent Name:

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